| 摘要 |
<p>PROBLEM TO BE SOLVED: To irradiate a laser beam with satisfactory accuracy. SOLUTION: By a laser annealing device, a substrate 9 is irradiated with the laser beam from a laser irradiation device 1 via a pattern on a mask 6. When a drive stage 10b for the mask 6 or a drive stage 10a for the substrate 9 is driven, the substrate 9 and the laser beam irradiating the substrate can be moved relatively. Whenever a signal p or r for position information indicating a position regarding the substrate 9 or the mask 6 changed due to their relative movement is detected at a cycle proportional to the acceleration of their relative movement, a signal q at an irradiation timing is output, and a prescribed irradiation position on the substrate 9 corresponding to the detected position information is irradiated with the laser beam. Consequently, the prescribed irradiation position can be irradiated over the whole region of a relative movement distance irrespective of a speed irregularity generated when the laser beam is shifted from the acceleration region of the relative movement to a constant speed region or when it is stopped from a deceleration region.</p> |
