| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat-developable photosensitive material excellent in fog suppression and capable of forming a photosensitive layer having good surface conditions because it has an undercoat layer excellent in scratch resistance of the undercoating surface. SOLUTION: The heat-developable photosensitive material has an undercoat layer obtained by applying and drying a coating liquid containing a modified polyester polymerized using benzoyl peroxide as a polymerization initiator and a photosensitive layer in this order on a support, wherein a modified moiety in the modified polyester constituting the undercoat layer contains constitutional units of at least one selected from glycidyl methacrylate, methyl methacrylate, ethyl methacrylate and styrene, and the proportion (molar ratio) of glycidyl methacrylate constitutional units to all constitutional units is <0.20.
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