发明名称 |
TFT FOR DISPLAY USING POLYSILICON AND FABRICATING METHOD THEREOF |
摘要 |
PURPOSE: A TFT for display using polysilicon and a fabricating method thereof are provided to simplify a fabricating method of the TFT for display by using polysilicon having a uniform characteristic. CONSTITUTION: An amorphous silicon layer(200) is formed on an upper portion of a substrate(100). A low reflective coating layer(300) is formed on an upper portion of the amorphous silicon layer(200). An excimer laser beam is irradiated on the low reflective coating layer(300) and the amorphous silicon layer(200). A liquified region(210) is locally formed on the amorphous silicon layer(200) by irradiating the excimer laser beam. A non-liquified region(220) is formed at both sides of the liquified region(220). A polysilicon layer is formed by cooling the amorphous silicon layer(200).
|
申请公布号 |
KR20030026471(A) |
申请公布日期 |
2003.04.03 |
申请号 |
KR20010059317 |
申请日期 |
2001.09.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, MYEONG GU;KANG, SUK YEONG;KIM, HYEON JAE;SHIN, GYEONG JU |
分类号 |
H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|