发明名称 TFT FOR DISPLAY USING POLYSILICON AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A TFT for display using polysilicon and a fabricating method thereof are provided to simplify a fabricating method of the TFT for display by using polysilicon having a uniform characteristic. CONSTITUTION: An amorphous silicon layer(200) is formed on an upper portion of a substrate(100). A low reflective coating layer(300) is formed on an upper portion of the amorphous silicon layer(200). An excimer laser beam is irradiated on the low reflective coating layer(300) and the amorphous silicon layer(200). A liquified region(210) is locally formed on the amorphous silicon layer(200) by irradiating the excimer laser beam. A non-liquified region(220) is formed at both sides of the liquified region(220). A polysilicon layer is formed by cooling the amorphous silicon layer(200).
申请公布号 KR20030026471(A) 申请公布日期 2003.04.03
申请号 KR20010059317 申请日期 2001.09.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG, MYEONG GU;KANG, SUK YEONG;KIM, HYEON JAE;SHIN, GYEONG JU
分类号 H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L29/786
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