发明名称 |
ELECTRON MICROSCOPE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a means for performing the correction of the thickness of an analyzing place and accurate EDX mapping in a case for performing the EDX analysis of a sample by an analyzing electron microscope. SOLUTION: The EELS analysis of the same place is also performed simultaneously with EDX analysis and the thickness of the analyzing place is corrected on the basis of the thickness data obtained by EELS. There is effect capable of obtaining accurate EDX mapping wherein the thickness of the sample is corrected and the fluctuations of a probe current during mapping are also corrected.</p> |
申请公布号 |
JP2003098130(A) |
申请公布日期 |
2003.04.03 |
申请号 |
JP20010290516 |
申请日期 |
2001.09.25 |
申请人 |
HITACHI LTD;HITACHI SCI SYST LTD |
发明人 |
UEKI YASUMITSU;NAGAOKI ISAO |
分类号 |
G01N23/225;G01N23/04;G21K5/04;H01J37/252;(IPC1-7):G01N23/225 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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