发明名称 RF CIRCUITS INCLUDING TRANSISTORS HAVING STRAINED MATERIAL LAYERS
摘要 <p>Circuits for processing radio frequency ('RF') and microwave signals are fabricated using field effect transistors ('FETs') that have one or more strained channel layers disposed on one or more planarized substrate layers. FETs having such a configuration exhibit improved values for, for example, transconductance and noise figure. RF circuits such as, for example, voltage controlled oscillators ('VCOs'), low noise amplifiers ('LNAs'), and phase locked loops ('PLLs') built using these FETs also exhibit enhanced performance.</p>
申请公布号 WO2003028106(A2) 申请公布日期 2003.04.03
申请号 US2002030226 申请日期 2002.09.24
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