发明名称 ANTIREFLECTIVE TRANSFER FILM AND METHOD FOR ANTIREFLECTION PROCESSING BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To carry out antireflection processing with high productivity at a low cost by a fine rugged pattern so that the reflection of light can be decreased and the visibility of a display can be improved. SOLUTION: The transfer film as an antireflective transfer film 10 is obtained by depositing a transparent resin layer 4 as a transfer layer 3 or further depositing an adhesive layer 5 on a releasing base film 1 having a specified fine rugged pattern 2A on the release face E. The fine rugged pattern 2A is formed in such a manner that the period PMAX of the lowest part of the recesses in the fine rugged pattern is controlled to equal to or smaller than the minimum wavelength λMIN in the wavelength region of visible rays in vacuum and that the cross-sectional area rate of the releasing base film material part in the horizontal cross section gradually and continuously decreases with increasing height from the lowest part to the highest part of the fine rugged pattern. The antireflective processing is carried out by transferring the transfer layer to the objective base material by using the above transfer film. The transfer processing is carried out by a roller transfer method, hot stamp method, simultaneous injection molding and transfer method or the like.
申请公布号 JP2003098304(A) 申请公布日期 2003.04.03
申请号 JP20010293225 申请日期 2001.09.26
申请人 DAINIPPON PRINTING CO LTD 发明人 SUZUKI TOMOYUKI;ITO ARIMICHI
分类号 G02F1/1335;G02B1/11 主分类号 G02F1/1335
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