METHOD FOR REVIEWING DEFECT INSPECTION

摘要

PROBLEM TO BE SOLVED: To solve the problem that the throughput is low because of the need of imaging a comparison image for an imaged image of an inspection position in a region where a semiconductor pattern has no periodicity although a method of calculating a difference image based on pattern matching is generally used to detect defects of the semiconductor. SOLUTION: An image of the inspection position is divided by every local region, and is subjected to matching with a local region of an image already stored for each region. A difference of matching local regions is obtained, whereby a defect region is extracted.