MULTILAYER FILM REMOVING APPARATUS AND METHOD, MULTILAYER FILM REFLECTION MIRROR AND X-RAY EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide multilayer film removing apparatus and method that can remove a multilayer film of a multilayer film reflection mirror in a desired distribution with high precision. SOLUTION: A multilayer film 1a is formed by alternately laminating at least two kinds of materials different in refractivity at a predetermined period length, and a multilayer film reflection mirror 1 comprises the multilayer film 1a on a substrate. The multilayer film removing apparatus removes a part of the multilayer film of the multilayer film reflection mirror 1 to correct the phase of the reflection wave surface of the multilayer film reflection mirror. When removing a part of the multilayer film, the apparatus can set a desired distribution to the removable amount of the multilayer film on the surface of the multilayer film. Accordingly, the multilayer film of the multilayer film reflection mirror can be removed in a desired distribution with high precision.