发明名称 |
Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern |
摘要 |
A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices
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申请公布号 |
US2003064303(A1) |
申请公布日期 |
2003.04.03 |
申请号 |
US20020110237 |
申请日期 |
2002.04.23 |
申请人 |
NISHIMURA ISAO;BESSHO NOBUO;KUMANO ATSUSHI;SHIMOKAWA TSUTOMU;YAMADA KENJI |
发明人 |
NISHIMURA ISAO;BESSHO NOBUO;KUMANO ATSUSHI;SHIMOKAWA TSUTOMU;YAMADA KENJI |
分类号 |
C08L67/00;C08L69/00;C08L83/14;G02B1/04;G02B5/18;G02B6/124;G03F7/00;G03F7/004;G03F7/039;G03F7/075;(IPC1-7):G03F7/004;G03F7/36;C0811/00;G03B3/00;G03H1/02 |
主分类号 |
C08L67/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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