发明名称 |
Semiconductor manufacturing/testing ceramic heater |
摘要 |
An object of the present invention is to provide a ceramic heater for a semiconductor producing/examining device wherein a scattering in the resistance value of its resistance heating element is hardly generated and its heating face is excellent in temperature evenness. The present invention is a ceramic heater for a semiconductor producing/examining device having a resistance heating element formed on a surface of a ceramic substrate, wherein a gutter is formed along the direction of current flowing through the resistance heating element.
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申请公布号 |
US2003062358(A1) |
申请公布日期 |
2003.04.03 |
申请号 |
US20020070441 |
申请日期 |
2002.06.26 |
申请人 |
ITO ATSUSHI;KARIYA SATORU |
发明人 |
ITO ATSUSHI;KARIYA SATORU |
分类号 |
H01L21/00;H01L21/683;(IPC1-7):H05B3/68 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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