发明名称 Semiconductor manufacturing/testing ceramic heater
摘要 An object of the present invention is to provide a ceramic heater for a semiconductor producing/examining device wherein a scattering in the resistance value of its resistance heating element is hardly generated and its heating face is excellent in temperature evenness. The present invention is a ceramic heater for a semiconductor producing/examining device having a resistance heating element formed on a surface of a ceramic substrate, wherein a gutter is formed along the direction of current flowing through the resistance heating element.
申请公布号 US2003062358(A1) 申请公布日期 2003.04.03
申请号 US20020070441 申请日期 2002.06.26
申请人 ITO ATSUSHI;KARIYA SATORU 发明人 ITO ATSUSHI;KARIYA SATORU
分类号 H01L21/00;H01L21/683;(IPC1-7):H05B3/68 主分类号 H01L21/00
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