| 摘要 |
A structured layer on semiconductor substrate is produced by modifying the layer surface, forming an acid-forming photoresist layer, exposing the photoresist layer to light for embodying an acid-containing layer in the photoresist layer in accordance with a specified structure of a photoexposure mask, and selectively removing the acid-containing region with a lye. Production of a structured layer on a semiconductor substrate involves forming the layer on the substrate (1), modifying the layer surface to form a chemically neutral surface, forming an acid-forming photoresist layer (3) on the layer on the substrate, exposing the photoresist layer to light for embodying an acid-containing layer in the photoresist layer in accordance with a specified structure of a photoexposure mask, and selectively removing the acid-containing region of the photoresist layer with a lye.
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