发明名称 SEMITRANSMISSIVE REFLECTION BASE PLATE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a simpler method for manufacturing an open type translucent reflection base plate. SOLUTION: A microlens array (31) is formed on a whole face of such a semitransmissive base plate (3) as glass and a reflection film (33) is formed on the other face. The microlens array (31) is irradiated with a laser beam (54) and a fine hole (34) is formed in the reflection film (33). A convex lens, a 'Selfoc' lens, a lens of a distributed refractive index type, a Fresnel lens or a diffraction lens is usable in the microlens array. Thus, the open type semitransmissive reflection base plate (3) is available without the positioning process of the microlens array (31) and the fine hole (34), an etching process for forming the fine hole (34) or the like.
申请公布号 JP2003098327(A) 申请公布日期 2003.04.03
申请号 JP20010294471 申请日期 2001.09.26
申请人 SEIKO EPSON CORP 发明人 NAGASAKA KIMIO;MIYAMAE AKIRA;FUJII EIICHI
分类号 G02B5/08;G02B5/10;G02F1/1335 主分类号 G02B5/08
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