发明名称 Pattern inspection method and system therefor
摘要 Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, the present invention, by using image data in addition to characteristic quantitative data as the defect data for an inspection system, enables the retrieval of image data via an outside results confirmation system. Further, in the case of defect data of a plurality of substrates, it is enabled to display a defect image during inspection by the fact that similar defects are retrieved via images and retrieval results are displayed as trends makes it possible to display a defect image during inspection by searching similar defects on images and displaying them as a trend, designating a substrate on the trend, thereby displaying the defect map thereof and designating a defect on the defect map.
申请公布号 US2003062487(A1) 申请公布日期 2003.04.03
申请号 US20020062666 申请日期 2002.02.05
申请人 发明人 HIROI TAKASHI;WATANABE MASAHIRO;KUNI ASAHIRO;TANAKA MAKI;FUKUNISHI MUNENORI;MIYAI HIROSHI;NARA YASUHIKO;ISOBE MITSUNOBU
分类号 G01B15/00;G01B15/04;G01B15/08;G01N21/956;G01N23/04;G01N23/20;G01N23/22;G01N23/225;G06K9/64;G06T7/00;H01L21/027;H01L21/66;(IPC1-7):G01N23/00 主分类号 G01B15/00
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