Method of fabrication a flash memory cell

摘要

A method of fabricating a flash memory cell. The method includes the steps of providing a semiconductor substrate; forming a first gate insulating layer; forming a first conductive layer; forming a barrier layer; removing a portion of the barrier layer to form a first opening; performing an angled implant on the exposed surface of the first conductive layer; forming a floating gate insulating layer; removing the barrier layer; forming a floating gate and a first gate insulating layer; forming a second insulating layer; forming a second conductive layer; removing portions of the second conductive layer and the second insulating layer to form a second opening and a third opening; forming a source region on the substrate; forming spacers on the sidewalls of the second opening and the third opening; and forming drain regions on the substrate within the third opening.