发明名称 Crystalline semiconductor film and production method thereof, and semiconductor device and production method thereof
摘要 A crystalline semiconductor film, the crystalline semiconductor film being formed over an insulative substrate, and including semiconductor crystal grains laterally grown along a surface of the insulative substrate, wherein the laterally-grown semiconductor crystal grains are in contact with each other at grain boundaries, and a distance between adjacent grain boundaries is equal to or smaller than two times a lateral growth distance of the semiconductor crystal grains.
申请公布号 US2003061984(A1) 申请公布日期 2003.04.03
申请号 US20020254013 申请日期 2002.09.25
申请人 MAEKAWA MASASHI;FUKUYAMA KEIICHI;IWAI MICHINORI;TANAKA KOHEI 发明人 MAEKAWA MASASHI;FUKUYAMA KEIICHI;IWAI MICHINORI;TANAKA KOHEI
分类号 C30B13/00;H01L21/20;H01L21/336;H01L21/77;(IPC1-7):C30B1/00;C30B3/00;C30B5/00;C30B28/02 主分类号 C30B13/00
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