发明名称 |
Crystalline semiconductor film and production method thereof, and semiconductor device and production method thereof |
摘要 |
A crystalline semiconductor film, the crystalline semiconductor film being formed over an insulative substrate, and including semiconductor crystal grains laterally grown along a surface of the insulative substrate, wherein the laterally-grown semiconductor crystal grains are in contact with each other at grain boundaries, and a distance between adjacent grain boundaries is equal to or smaller than two times a lateral growth distance of the semiconductor crystal grains.
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申请公布号 |
US2003061984(A1) |
申请公布日期 |
2003.04.03 |
申请号 |
US20020254013 |
申请日期 |
2002.09.25 |
申请人 |
MAEKAWA MASASHI;FUKUYAMA KEIICHI;IWAI MICHINORI;TANAKA KOHEI |
发明人 |
MAEKAWA MASASHI;FUKUYAMA KEIICHI;IWAI MICHINORI;TANAKA KOHEI |
分类号 |
C30B13/00;H01L21/20;H01L21/336;H01L21/77;(IPC1-7):C30B1/00;C30B3/00;C30B5/00;C30B28/02 |
主分类号 |
C30B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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