发明名称 Asymmetrical mosfet layout for high currents and high speed operation
摘要 A structure and method for a field effect transistor capable of handling high currents, comprises interleaved source and drain diffusion regions with drain diffusion contacts to a first metal level over the drain diffusions only; while a second metal level covers the full width of the device and takes current out of the source in a primarily vertical direction.
申请公布号 US2003064574(A1) 申请公布日期 2003.04.03
申请号 US20010968219 申请日期 2001.10.01
申请人 PARKER SCOTT M.;TANGHE STEVEN J. 发明人 PARKER SCOTT M.;TANGHE STEVEN J.
分类号 H01L21/336;H01L29/06;H01L29/417;(IPC1-7):H01L21/22 主分类号 H01L21/336
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