| 摘要 |
The coordinate value of the deficient area detected by a wafer inspecting apparatus and the wafer inspecting data are transmitted to a coordinate transforming computer by use of an inspection-data managing computer. The coordinate value detected by the wafer inspection based on the wafer inspecting data and the photomask inspecting data is transformed into the coordinate value on the photomask, to thereby analyze the deficient area of the photomask. |
