| 发明名称 |
METHOD AND APPARATUS FOR REDUCING STRESS BETWEEN DEPOSITIONS WITHIN A SUBSTRATE TUBE |
| 摘要 |
A silica tube (20) has an inner porous silica layer. A halogen-containing gas (18) flows into the tube to dope the porous layer with the halogen. A second halogen is also added to the porous layer. Chlorine is one of the preferred halogens.
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| 申请公布号 |
WO03027032(A1) |
申请公布日期 |
2003.04.03 |
| 申请号 |
WO2002US28933 |
申请日期 |
2002.09.10 |
| 申请人 |
CORNING INCORPORATED |
发明人 |
DESANDRO, JEAN-PHILIPPE;HOUSE, KEITH, L.;KOH, JOOHYUN;MAZUMDER, PRANTIK |
| 分类号 |
C03B37/018;G02B6/02;(IPC1-7):C03B37/018 |
主分类号 |
C03B37/018 |
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