发明名称 APPARATUS FOR DETOXIFICATION PROCESS OF PCB
摘要 PROBLEM TO BE SOLVED: To provide an apparatus which securely and economically causes dechlorination of PCB and detoxifies a whole radiation liquid with a simple process in which a scattered electron beam of 1 MeV or less is radiated to PCB, an oil containing PCB or a liquid containing PCB. SOLUTION: A radiation liquid is obtained by mixing PCB, an oil containing PCB or a liquid containing PCB with an alkali liquid and isopropyl alcohol. The radiation liquid is discharged as a thin film having the same thickness as the in-liquid range of the electron beam range or a line having the same diameter and a scattered electron beam is radiated to it. Otherwise after the radiation liquid is atomized or emulsified to reduce its apparent density and increase the electron beam range, it is discharged as a thin film having the same thickness as the electron beam range or a line having the same diameter and then a scattered electron beam is radiated to it. In another way, the radiation liquid is stirred or circulated and a scattered electron beam is radiated to it. In either way, a scattered electron beam is radiated to the whole radiation liquid to cause dechlorination.
申请公布号 JP2003093539(A) 申请公布日期 2003.04.02
申请号 JP20010333499 申请日期 2001.09.26
申请人 NIPPON DENSHI BEAM KK 发明人 TANABE TOMOMI
分类号 A62D3/15;A62D3/34;A62D3/36;A62D101/22;B01J19/12;(IPC1-7):A62D3/00 主分类号 A62D3/15
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