发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can detoxify ozone used for substrate treatment to discharge it efficiently. SOLUTION: The end of piping 3 is inserted into a tank 1, and an on/off valve 5 is inserted in the piping 3. An ozone concentration measuring instrument 4 is installed in the piping 3 on the downstream side of the on/off valve 5. One end of piping 7 is inserted into the lower part of the tank 1, and an on/off valve 8 is inserted in the piping 7. An ozone concentration measuring instrument 9 is installed in the piping 7 on the upstream side of the on/off valve 8. An ultraviolet ray generator 6 is installed in the tank 1. The ozone concentration measuring instrument 4, the on/off valves 5, 8, the ultraviolet ray generator 6, and an ozone concentration measuring instrument 9 are controlled by a control part 10. The ultraviolet ray generator 6 is equipped with an ultraviolet lamp. Waste liquid containing ozone is irradiated with ultraviolet rays to convert ozone to harmless oxygen.</p>
申请公布号 JP2003093871(A) 申请公布日期 2003.04.02
申请号 JP20010288437 申请日期 2001.09.21
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MAEKAWA NAOTADA;KANEMOTO KAZUMI
分类号 B01D53/66;B01D15/00;B01J19/00;B01J19/12;H01L21/302;H01L21/304;H01L21/3065;(IPC1-7):B01J19/12;H01L21/306 主分类号 B01D53/66
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