发明名称 APPARATUS FOR APPLYING COATING LIQUID TO SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide an applying apparatus for forming a coated film having uniform thickness on the whole surface of a substrate. SOLUTION: A slit-shaped discharge port 2 of a liquid discharging nozzle 12 is formed with a fixed plate 18 opposed to a shifting plate 20 while a narrow gap 22 is interposed between them and the plate 20 shiftable to the direction that the plate 20 goes close to or apart from the plate 18. A plurality of piezoelectric actuators 16 for shifting the plate 20 are arrayed along the longitudinal direction of the port 2 and controlled individually so that the coating liquid to be discharged from the port 2 forms a uniform liquid film.
申请公布号 JP2003093944(A) 申请公布日期 2003.04.02
申请号 JP20010295233 申请日期 2001.09.27
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SAKAI TAKAMASA;MATSUNAGA SANENOBU
分类号 G03F7/16;B05B1/04;B05B1/30;B05C5/00;H01L21/027 主分类号 G03F7/16
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