发明名称 |
APPARATUS FOR APPLYING COATING LIQUID TO SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide an applying apparatus for forming a coated film having uniform thickness on the whole surface of a substrate. SOLUTION: A slit-shaped discharge port 2 of a liquid discharging nozzle 12 is formed with a fixed plate 18 opposed to a shifting plate 20 while a narrow gap 22 is interposed between them and the plate 20 shiftable to the direction that the plate 20 goes close to or apart from the plate 18. A plurality of piezoelectric actuators 16 for shifting the plate 20 are arrayed along the longitudinal direction of the port 2 and controlled individually so that the coating liquid to be discharged from the port 2 forms a uniform liquid film. |
申请公布号 |
JP2003093944(A) |
申请公布日期 |
2003.04.02 |
申请号 |
JP20010295233 |
申请日期 |
2001.09.27 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
SAKAI TAKAMASA;MATSUNAGA SANENOBU |
分类号 |
G03F7/16;B05B1/04;B05B1/30;B05C5/00;H01L21/027 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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