发明名称 |
System and method for electroplating fine geometries |
摘要 |
<p>An electroplating system 10 is described which provides for the formation of a conductive layer on a workpiece 12. The current used to electroplate the workpiece 12 is controlled by a controller 26. The rotation of the workpiece within a solution containing conductive material is controlled by a rotation controller 22. The current level and/or rotation of the workpiece is controlled in such a way that the non-uniform growth of large grains within the conductive film is minimized. <IMAGE></p> |
申请公布号 |
EP1298233(A2) |
申请公布日期 |
2003.04.02 |
申请号 |
EP20020079503 |
申请日期 |
2002.09.26 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
GUILDI, RICHARD L.;HSU, WEI-YUNG |
分类号 |
C25D5/18;C25D5/04;C25D7/00;C25D7/12;C25D21/12;H01L21/288;(IPC1-7):C25D7/12 |
主分类号 |
C25D5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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