发明名称 System and method for electroplating fine geometries
摘要 <p>An electroplating system 10 is described which provides for the formation of a conductive layer on a workpiece 12. The current used to electroplate the workpiece 12 is controlled by a controller 26. The rotation of the workpiece within a solution containing conductive material is controlled by a rotation controller 22. The current level and/or rotation of the workpiece is controlled in such a way that the non-uniform growth of large grains within the conductive film is minimized. <IMAGE></p>
申请公布号 EP1298233(A2) 申请公布日期 2003.04.02
申请号 EP20020079503 申请日期 2002.09.26
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 GUILDI, RICHARD L.;HSU, WEI-YUNG
分类号 C25D5/18;C25D5/04;C25D7/00;C25D7/12;C25D21/12;H01L21/288;(IPC1-7):C25D7/12 主分类号 C25D5/18
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