发明名称 |
Apparatus to produce large inductive plasma for plasma processing |
摘要 |
<p>The inductive type plasma processing chamber (10) has two or more windows (22a, 22b) for receiving induced field energy, each window enabling induced field energy to enter the chamber from a respective direction, and further comprises one or more partitions to isolate spaces therein associated with one or a group of windows (22a, 22b). The partitioning may be ensured by a workpiece support structure (38, 40) in conjunction with at least one workpiece (16) and by gas-tight seals at the point of contact between the support structure and the workpiece(s). <IMAGE></p> |
申请公布号 |
EP0908923(B1) |
申请公布日期 |
2003.04.02 |
申请号 |
EP19980401199 |
申请日期 |
1998.05.19 |
申请人 |
EUROPEAN COMMUNITY |
发明人 |
COLPO, PASCAL;ROSSI, FRANCOIS;DAVIET, JEAN;ERNST, ROLAND |
分类号 |
H05H1/46;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01J37/32 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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