发明名称 FACIAL TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide the maximum facial effect by applying a pulse current of a waveform appropriately corresponding to a person subjected to a facial treatment. SOLUTION: In between a first conductor 5 capable of contacting a surface of a human face and a second conductor 41 capable of contacting a body surface at a position separated from a portion contacted by the first conductor 5, a frequency and a pulse width of the pulse current applied from a low frequency power source 15 to the surface of the face are adjusted by a frequency adjusting means 31 and a pulse width adjusting means 33.
申请公布号 JP2003093462(A) 申请公布日期 2003.04.02
申请号 JP20010297266 申请日期 2001.09.27
申请人 SUIKEN:KK 发明人 TAMAMURA SEIICHIRO;OGAWA SOUICHI
分类号 A61N1/32;A61H15/00;(IPC1-7):A61H15/00 主分类号 A61N1/32
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