发明名称 |
PATTERN FORMATION |
摘要 |
<p>A precursor for preparing a resist pattern comprises an imageable layer which includes a relatively volatile compound that can be volatilized by application of heat, wherein imaging radiation can be applied to the precursor to heat areas thereof and volatilizes said compound so that properties, for example, the ink accepting abilities of heated and non heated areas, are different.</p> |
申请公布号 |
EP0996544(B1) |
申请公布日期 |
2003.04.02 |
申请号 |
EP19980932299 |
申请日期 |
1998.06.26 |
申请人 |
KODAK POLYCHROME GRAPHICS COMPANY LTD. |
发明人 |
RAY, KEVIN, BARRY;SPOWAGE, MARK, JOHN |
分类号 |
G03F7/004;B41C1/10;B41M5/36;B41N1/14;G03F7/00;(IPC1-7):B41C1/10 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|