发明名称 Semiconductor memory device and manufacturing method thereof
摘要 A memory cell has a cylindrical electrode having a porous cylindrical portion, and insulating layers for making less steep the height of cylindrical electrode are provided in the peripheral circuit region. Thus a semiconductor memory device and manufacturing method thereof can be provided in which the step between the memory cell array region and the peripheral circuit region can be made less steep by a smaller number of manufacturing steps.
申请公布号 US6541337(B2) 申请公布日期 2003.04.01
申请号 US20010816399 申请日期 2001.03.26
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MATSUFUSA JIRO
分类号 H01L21/8242;H01L21/02;H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L21/8242
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