Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same

摘要

The photoacid generator according to the present invention is represented by the general formula (1):wherein R1 and R2 are respectively H, OH or alkyl or alkoxy group of C1-5 and are the same or different, n is an integer from 1 to 3, and Ar1 is a naphthalene unit.The photosensitive resin used in a composition of the invention is represented by the general formula (2):wherein X is a tetravalent aromatic or aliphatic organic radical, Y is a bivalent aromatic or aliphatic organic radical, and R3 and R4 independently are H or a monovalent aliphatic organic protecting group removable by acid.