发明名称 |
Synthetic quartz glass member for excimer laser and method of making |
摘要 |
A synthetic quartz glass member having (i) a change of transmittance at 193 nm of up to 0.002 cm-1 as expressed in extinction coefficient when 4x104 shots of ArF excimer laser light are irradiated at 2 mJ/cm2/pulse, (ii) an initial transmittance of at least 99.6% at 193 nm, (iii) a hydrogen molecule content of at least 5x1017 molecules/cm3, (iv) a refractive index amplitude of up to 1x10-6, and (v) a birefringence of up to 1 nm/cm finds use in an excimer laser because it experiences a minimized change of light transmittance. |
申请公布号 |
US6541405(B1) |
申请公布日期 |
2003.04.01 |
申请号 |
US20000610860 |
申请日期 |
2000.07.06 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;SHIN-ETSU QUARTZ PRODUCTS CO. LTD. |
发明人 |
OTSUKA HISATOSHI;SHIROTA KAZUO;FUJINOKI AKIRA |
分类号 |
H01L21/027;C03B8/04;C03B19/14;C03B20/00;C03C3/06;C03C4/00;G02B1/02;G03F1/14;G03F1/60;G03F7/20;(IPC1-7):C03B19/09 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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