发明名称 MOS variable capacitor with controlled dC/dV and voltage drop across W of gate
摘要 A voltage-variable capacitor is constructed from a metal-oxide-semiconductor transistor. The transistor source has at least two contacts that are biased to different voltages. The source acts as a resistor with current flowing from an upper source contact to a lower source contact. The gate-to-source voltage varies as a function of the position along the source-gate edge. A critical voltage is where the gate-to-source voltage is equal to the transistor threshold. A portion of the source has source voltages above the critical voltage and no conducting channel forms under the gate. Another portion of the source has source voltages below the critical voltage, and thus a conducting channel forms under the gate for this portion of the capacitor. By varying either the gate voltage or the source voltages, the area of the gate that has a channel under it is varied, varying the capacitance. Separate source islands eliminate source current.
申请公布号 US6541814(B1) 申请公布日期 2003.04.01
申请号 US20010682993 申请日期 2001.11.06
申请人 PERICOM SEMICONDUCTOR CORP. 发明人 CAO MIN;HATTORI HIDE
分类号 H01L29/94;(IPC1-7):H01L27/108;H01L29/00;H01L29/76;H01L29/93;H01L31/119 主分类号 H01L29/94
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