发明名称 Method of manufacturing electron-beam source and image forming apparatus using same, and activation processing method
摘要 When manufacturing an electron-beam source, an activation is performed. To generate activation material at a plurality of electron-emitting devices; by dividing the plurality of electron-emitting devices into plural groups and sequentially applying voltage to each group.
申请公布号 US6540575(B1) 申请公布日期 2003.04.01
申请号 US19990353374 申请日期 1999.07.15
申请人 CANON KABUSHIKI KAISHA 发明人 SUZUKI NORITAKE;SUZUKI HIDETOSHI;YAMAGUCHI EIJI
分类号 G09G3/22;H01J1/316;H01J9/02;(IPC1-7):H01J9/02 主分类号 G09G3/22
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