发明名称 |
Method of manufacturing electron-beam source and image forming apparatus using same, and activation processing method |
摘要 |
When manufacturing an electron-beam source, an activation is performed. To generate activation material at a plurality of electron-emitting devices; by dividing the plurality of electron-emitting devices into plural groups and sequentially applying voltage to each group.
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申请公布号 |
US6540575(B1) |
申请公布日期 |
2003.04.01 |
申请号 |
US19990353374 |
申请日期 |
1999.07.15 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUZUKI NORITAKE;SUZUKI HIDETOSHI;YAMAGUCHI EIJI |
分类号 |
G09G3/22;H01J1/316;H01J9/02;(IPC1-7):H01J9/02 |
主分类号 |
G09G3/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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