发明名称 CAPACITOR HAVING DOUBLE BARRIER LAYER OF HETEROGENEOUS NITRIDE AND METHOD FOR FORMING ELECTRODE OF THE SAME
摘要 PURPOSE: A capacitor having a double barrier layer of heterogeneous nitride and a method for forming an electrode of the same are provided to form the capacitor with a dielectric material having a high dielectric constant by using the double barrier layer. CONSTITUTION: A polysilicon layer(21) is formed on an upper face of a substrate. An ASix layer(1<x<3)(22) is formed on an upper face of the polysilicon layer(21). An A1-ySiyN layer(0 <=y<1)(23) as the first barrier is formed on an upper face of the ASix layer(1<x<3)(22) where A is Ti or Ta. A DzA1-zN layer(0<z<1)(24) as the second barrier layer is formed on an upper face of the A1-ySiyN layer(0 <=y<1)(23) where A is Ti, W or Ta and D is Cr, Re or Al. A lower electrode(25) is formed on an upper face of the DzA1-zN layer(0<z<1)(24). A dielectric layer(26) is formed on an upper face of the lower electrode(25). An upper electrode(27) is formed on an upper face of the dielectric layer(26).
申请公布号 KR20030025691(A) 申请公布日期 2003.03.29
申请号 KR20010058860 申请日期 2001.09.22
申请人 KIM, JI YOUNG;KOOKMIN UNIVERSITY FOUNDATION 发明人 KIM, JI YOUNG;KOO, JUN MO
分类号 H01L21/8242;(IPC1-7):H01L21/824 主分类号 H01L21/8242
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