发明名称 |
CAPACITOR HAVING DOUBLE BARRIER LAYER OF HETEROGENEOUS NITRIDE AND METHOD FOR FORMING ELECTRODE OF THE SAME |
摘要 |
PURPOSE: A capacitor having a double barrier layer of heterogeneous nitride and a method for forming an electrode of the same are provided to form the capacitor with a dielectric material having a high dielectric constant by using the double barrier layer. CONSTITUTION: A polysilicon layer(21) is formed on an upper face of a substrate. An ASix layer(1<x<3)(22) is formed on an upper face of the polysilicon layer(21). An A1-ySiyN layer(0 <=y<1)(23) as the first barrier is formed on an upper face of the ASix layer(1<x<3)(22) where A is Ti or Ta. A DzA1-zN layer(0<z<1)(24) as the second barrier layer is formed on an upper face of the A1-ySiyN layer(0 <=y<1)(23) where A is Ti, W or Ta and D is Cr, Re or Al. A lower electrode(25) is formed on an upper face of the DzA1-zN layer(0<z<1)(24). A dielectric layer(26) is formed on an upper face of the lower electrode(25). An upper electrode(27) is formed on an upper face of the dielectric layer(26).
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申请公布号 |
KR20030025691(A) |
申请公布日期 |
2003.03.29 |
申请号 |
KR20010058860 |
申请日期 |
2001.09.22 |
申请人 |
KIM, JI YOUNG;KOOKMIN UNIVERSITY FOUNDATION |
发明人 |
KIM, JI YOUNG;KOO, JUN MO |
分类号 |
H01L21/8242;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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