| 摘要 |
PURPOSE: A shield for vacuum deposition thin film coating chamber which not only increases operating rate due to lengthening of life span, but also reduces cost due to reuse of the shield, and a manufacturing method of the shield are provided. CONSTITUTION: The manufacturing method of a shield for vacuum deposition thin film coating chamber comprises a step (S2) of performing blast treatment for increasing adhesive force of coating; a step (S3) of performing ultrasonic cleaning to prevent coating adhesive force from lowering due to fine bead powder by removing foreign materials as fine bean powder is stuck to a shield after blast treatment of beads; a step (S4) of drying the ultrasonic cleaned shield at a certain temperature for a certain period of time after the ultrasonic cleaning; a step (S5) of forming a spray coating layer by continuously spray coating a metallic material on the surface of the shield; and a step (s6) of performing ultrasonic cleaning to clean the surface of the spray coated shield by removing residues or foreign materials on the surface of the spray coated shield after the spray coating, wherein the manufacturing method comprises a step (S1) of fabricating a coating tool to maintain the optimum coating state according to the shape of the shield before the step (S2) of performing blast treatment and a step (S7) of performing heat treatment to reinforce strength of the shield after the steps (S5,S6) of the spray coating and ultrasonic cleaning, and wherein the blast treatment step (S2) further comprises a step (S21) of correcting the defects if defects such as bending and distortion are formed during blast treatment.
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