发明名称 |
APPARATUS AND METHOD FOR MEASURING THICKNESS PROFILE AND REFRACTIVE INDEX DISTRIBUTION OF MULTI-LAYERED THIN FILM USING TWO-DIMENSIONAL REFLECTOMETRY |
摘要 |
PURPOSE: An apparatus and a method are provided to achieve improved reliability and accuracy of measurement, while reducing the measurement time by measuring the thickness profile and refractive index distribution at multiple points within a predetermined area. CONSTITUTION: An apparatus comprises a sample substrate transfer unit for supporting a sample substrate; an optical unit for providing light to be projected on the sample substrate; a narrow band pass optical filter set for selectively filtering the light projected on the sample substrate or the light reflected from the sample substrate; charge-coupled devices arranged in a two-dimensional way, and which sense the reflected light incident through optical filters(538) mounted on the narrow band pass optical filter set; a frame grabber for grabbing picture frame data contained in the reflected light sensed by charge-coupled devices; a computing element for computing the film thickness, thickness profile or refractive index by iteratively performing a non-linear error minimization method, through the use of data grabbed by the frame grabber; an image processor(548), an information processor(550) and a controller for processing picture frame data and controlling the computing element.
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申请公布号 |
KR20030025891(A) |
申请公布日期 |
2003.03.29 |
申请号 |
KR20020057581 |
申请日期 |
2002.09.23 |
申请人 |
K-MAC |
发明人 |
KIM, JIN YONG;KIM, YEONG RYEOL;LEE, JUNG HWAN;PARK, JI JONG |
分类号 |
G01B11/06;(IPC1-7):G01B11/06 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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