| 摘要 |
PROBLEM TO BE SOLVED: To provide a luminous exposure control apparatus and a luminous exposure control method that can accurately adjust luminous exposure for each shot and during exposure, at the same time, to reduce manufacturing costs, to achieve appropriate luminous exposure control such as quick stabilization of output, and to provide a scanning projection aligner. SOLUTION: An illumination optical system has at least one of a light source 1 for exposure for generating illumination light for exposure, a light-shielding means 10 for shielding the illumination light from the light source 1 for exposure, and an optical system 9 comprising a beam attenuation filter for reducing the illumination light from the light source 1 for exposure. An anti-glare means 10 and/or the optical system 9, and at least one of the scanning rates of a reticle 2 and a wafer 4 are adjusted so as to control luminous exposures as pulse lights.
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