发明名称 EXCESS LIQUID RECOVERY STRUCTURE FOR PHOTOSENSITIVE MATERIAL PROCESSING UNIT
摘要 PROBLEM TO BE SOLVED: To improve drainage performance without expanding the dimensions of an overflow tank. SOLUTION: A slit-like auxiliary watershoot 60 is provided so as to communicate with an excess liquid watershoot 52 provided at a side adjacent to the drying part 22 of a rinse tank 24C. The drainage performance to discharge an excess liquid is reliably secured without expanding the dimensions of a unit or extending the transporting path even when the unexpected excess liquid occurs from a side wall 54 at the side of the drying part 22 because the volume of the excess liquid watershoot 52 is significantly increased. Thereby, a box 62 in which the electrical parts and the control instruments of the drying part 22 are housed is protected from washing water. In the auxiliary watershoot 60, a space part 58 almost usually serves as airspace, thereby substitutes for a heat insulating material, and prevents the dew condensation of the rinse tank 24C.
申请公布号 JP2003091060(A) 申请公布日期 2003.03.28
申请号 JP20010285333 申请日期 2001.09.19
申请人 FUJI PHOTO FILM CO LTD 发明人 HIROZAWA NOBUHIKO;IDENAWA TATSUYUKI;YAMAZAKI KENICHI
分类号 G03D3/00;G03D13/00;(IPC1-7):G03D3/00 主分类号 G03D3/00
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