发明名称 VACUUM DEPOSITION MATERIAL ACCOMMODATION VESSEL, VACUUM DEPOSITION APPARATUS, AND METHOD FOR FEEDING DEPOSITION MATERIAL TO VACUUM VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum deposition material accommodation vessel, a vacuum deposition apparatus, and a deposition material feeding method in which air and impurities in a vacuum deposition material to be filled in a crucible are removed in order to obtain a deposition film of excellent quality in the vacuum deposition, and the evacuated deposition material can be fed to a crucible provided in an evaporation chamber while maintaining the vacuum in the evaporation chamber of the vacuum evaporation device. SOLUTION: The vacuum deposition apparatus comprises: an accommodation vessel having an evacuation port and an evacuation valve to remove any gas including air from the accommodation vessel and a deposition material to be accommodated, a filling port and a filling valve to fill the deposition material in the accommodation vessel while removing the gas, and a feed port and a feed valve to discharge the deposition material filled in the accommodation vessel; a temporary storage vessel to which the accommodation vessel can be connected and which is tightly closed, and a deposition material feed part which can be connected with the accommodation vessel and communicates with the crucible in the evaporation chamber.
申请公布号 JP2003089865(A) 申请公布日期 2003.03.28
申请号 JP20010282934 申请日期 2001.09.18
申请人 CLUSTER ION BEAM TECHNOLOGY KK;ROCK GIKEN KOGYO CO LTD 发明人 TAKAGI TOSHINORI;USUI HIROAKI;NAKAMURA HIROKI;KAWAGUCHI HARUHIKO
分类号 C23C14/24;(IPC1-7):C23C14/24 主分类号 C23C14/24
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