发明名称 |
VACUUM DEPOSITION MATERIAL ACCOMMODATION VESSEL, VACUUM DEPOSITION APPARATUS, AND METHOD FOR FEEDING DEPOSITION MATERIAL TO VACUUM VAPOR DEPOSITION APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum deposition material accommodation vessel, a vacuum deposition apparatus, and a deposition material feeding method in which air and impurities in a vacuum deposition material to be filled in a crucible are removed in order to obtain a deposition film of excellent quality in the vacuum deposition, and the evacuated deposition material can be fed to a crucible provided in an evaporation chamber while maintaining the vacuum in the evaporation chamber of the vacuum evaporation device. SOLUTION: The vacuum deposition apparatus comprises: an accommodation vessel having an evacuation port and an evacuation valve to remove any gas including air from the accommodation vessel and a deposition material to be accommodated, a filling port and a filling valve to fill the deposition material in the accommodation vessel while removing the gas, and a feed port and a feed valve to discharge the deposition material filled in the accommodation vessel; a temporary storage vessel to which the accommodation vessel can be connected and which is tightly closed, and a deposition material feed part which can be connected with the accommodation vessel and communicates with the crucible in the evaporation chamber.
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申请公布号 |
JP2003089865(A) |
申请公布日期 |
2003.03.28 |
申请号 |
JP20010282934 |
申请日期 |
2001.09.18 |
申请人 |
CLUSTER ION BEAM TECHNOLOGY KK;ROCK GIKEN KOGYO CO LTD |
发明人 |
TAKAGI TOSHINORI;USUI HIROAKI;NAKAMURA HIROKI;KAWAGUCHI HARUHIKO |
分类号 |
C23C14/24;(IPC1-7):C23C14/24 |
主分类号 |
C23C14/24 |
代理机构 |
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