| 摘要 |
PROBLEM TO BE SOLVED: To provide an ozone treatment apparatus which can form an oxide film of sufficient film thickness on the surface of a substrate by guiding high- density ozone gas to the substrate surface. SOLUTION: The ozone treatment apparatus is equipped with a mount base where the substrate is mounted, a heating means which heats the substrate K on the mount base, a treatment gas flow passage where treatment gas containing ozone flows, a cooling liquid flow passage where cooling liquid flows, a gas supply head 20 which has a treatment gas discharge hole opened in the surface facing the mount base and discharges the treatment gas toward the substrate K on the mount base from the treatment gas discharge hole, a treatment gas supply means 40 which supplies the treatment gas to the treatment gas flow passage, and a cooling liquid circulation means 60 which supplies the cooling liquid to the cooling liquid flow passage and circulates it. The gas supply head 20 has a through-hole, penetrating it from the surface which faces the mount base to the opposite surface, located near the treatment gas discharge hole.
|
