| 摘要 |
PROBLEM TO BE SOLVED: To provide a wet treatment apparatus in which a treatment solution can be supplied/recovered stably during an operation and in which the flow of the treatment solution to the discharge side from the introduction side of the treatment solution can be maintained uniform. SOLUTION: In the wet treatment apparatus, a face facing a substrate W to be treated is provided with a nozzle 1 which comprises a treatment-solution introduction part 3 used to introduce the treatment solution 10 to the substrate W to be treated, a treatment-solution recovery part 4 used to recover the treatment solution 10 from the substrate W to be treated and a board 2 used to connect the part 3 to the part 4. In the apparatus, a treatment-solution inlet port 16 which passes the board 2 and to which the treatment solution is introduced and a treatment-solution recovery port 17 are formed.
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