发明名称 |
MANUFACTURING METHOD OF SUBSTRATE FOR PLASMA DISPLAY PANEL |
摘要 |
PROBLEM TO BE SOLVED: To improve performance of a panel better than prior art by driving at a lower voltage than before by insulating the address electrode from gas discharge space, and by preventing accumulation of excess charge and suppressing leakage of gas from the partition wall. SOLUTION: This is a manufacturing method of a plasma display panel substrate that comprises a plurality of address electrodes, an insulating layer for insulating them from gas discharge space, and a partition wall for dividing the gas discharge space on the substrate. After an address electrode is formed on the above substrate and a semiconductor layer or a high resistance conductive layer for covering the address electrode is formed by a gas phase method, a partition wall is formed on the semiconductor layer or the high resistance conductive layer on both sides of the address electrode.
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申请公布号 |
JP2003092058(A) |
申请公布日期 |
2003.03.28 |
申请号 |
JP20010281660 |
申请日期 |
2001.09.17 |
申请人 |
FUJITSU HITACHI PLASMA DISPLAY LTD |
发明人 |
HARADA HIDEKI;KASAHARA SHIGEO |
分类号 |
H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36;H01J11/38;(IPC1-7):H01J9/02;H01J11/02 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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