发明名称 MANUFACTURING METHOD OF SUBSTRATE FOR PLASMA DISPLAY PANEL
摘要 PROBLEM TO BE SOLVED: To improve performance of a panel better than prior art by driving at a lower voltage than before by insulating the address electrode from gas discharge space, and by preventing accumulation of excess charge and suppressing leakage of gas from the partition wall. SOLUTION: This is a manufacturing method of a plasma display panel substrate that comprises a plurality of address electrodes, an insulating layer for insulating them from gas discharge space, and a partition wall for dividing the gas discharge space on the substrate. After an address electrode is formed on the above substrate and a semiconductor layer or a high resistance conductive layer for covering the address electrode is formed by a gas phase method, a partition wall is formed on the semiconductor layer or the high resistance conductive layer on both sides of the address electrode.
申请公布号 JP2003092058(A) 申请公布日期 2003.03.28
申请号 JP20010281660 申请日期 2001.09.17
申请人 FUJITSU HITACHI PLASMA DISPLAY LTD 发明人 HARADA HIDEKI;KASAHARA SHIGEO
分类号 H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36;H01J11/38;(IPC1-7):H01J9/02;H01J11/02 主分类号 H01J9/02
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