| 发明名称 |
MANUFACTURING METHOD USING DRY ETCHING SYSTEM |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry etching technique of a high grade. SOLUTION: A reaction product 9 sticking to an upper electrode 2 is removed by polishing, by which the surface roughness is set.
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| 申请公布号 |
JP2003089887(A) |
申请公布日期 |
2003.03.28 |
| 申请号 |
JP20010285429 |
申请日期 |
2001.09.19 |
| 申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
YAMADE TETSUYA |
| 分类号 |
C23F4/00;H01L21/302;H01L21/3065;(IPC1-7):C23F4/00;H01L21/306 |
主分类号 |
C23F4/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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