发明名称 |
APPARATUS FOR PREVENTING GAS LEAK OF SOURCE HEAD GAS LINE IN ION IMPLANTER |
摘要 |
PURPOSE: An apparatus for preventing a gas leak of a source head gas line in an ion implanter is provided to prevent the leakage of a connection portion in a process for assembling a gas line of a source head by forming a part of the source head gas line as a bellows tube. CONSTITUTION: The first connection portion(14) is combined with a lower portion of a side plate of an arc chamber(10). A gas line(12) is connected with the first connection portion(14) connected with the arc chamber(10). The second connection portion(20) is formed at a lower portion of the gas line(12). A bellows tube(22) is formed on the gas line(12). A plunger bolt is formed at the lower portion of the side plate of the arc chamber(10). A plunger nut is installed at an upper portion of the gas line(12). The plunger bolt is combined with the plunger nut.
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申请公布号 |
KR20030025000(A) |
申请公布日期 |
2003.03.28 |
申请号 |
KR20010057879 |
申请日期 |
2001.09.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, SANG HYEON |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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