发明名称 APPARATUS FOR PREVENTING GAS LEAK OF SOURCE HEAD GAS LINE IN ION IMPLANTER
摘要 PURPOSE: An apparatus for preventing a gas leak of a source head gas line in an ion implanter is provided to prevent the leakage of a connection portion in a process for assembling a gas line of a source head by forming a part of the source head gas line as a bellows tube. CONSTITUTION: The first connection portion(14) is combined with a lower portion of a side plate of an arc chamber(10). A gas line(12) is connected with the first connection portion(14) connected with the arc chamber(10). The second connection portion(20) is formed at a lower portion of the gas line(12). A bellows tube(22) is formed on the gas line(12). A plunger bolt is formed at the lower portion of the side plate of the arc chamber(10). A plunger nut is installed at an upper portion of the gas line(12). The plunger bolt is combined with the plunger nut.
申请公布号 KR20030025000(A) 申请公布日期 2003.03.28
申请号 KR20010057879 申请日期 2001.09.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, SANG HYEON
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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