| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid method, that allow processing liquid that is applied to a substrate to flow out quickly from the substrate. SOLUTION: A development processing unit (DEV) 24 that is one embodiment of a liquid processing apparatus comprises a roller conveyance mechanism 14 for conveying an LCD substrate G substantially the horizontal direction in substantially a horizontal posture, development nozzles 51a and 51b for applying developer to an LCD substrate G that is conveyed by the roller conveyance mechanism 14, and a brake member 15 for making the LCD substrate G that is coated with developer to stop suddenly and is carried by the roller conveyance mechanism 14. The LCD substrate G, coated with the developer is stopped suddenly by operating the brake member 15, and the developer on the LCD substrate G is made to flow out from the LCD substrate G by utilizing inertia. |
