HAZARDOUS PROCESS/PATTERN DETECTION SYSTEM AND METHOD, HAZARD DETECTION PROGRAM, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To set semiconductor process conditions which avoid the generation of crystal defects and a mask pattern shape on a simulation basis. SOLUTION: The hazardous process/pattern detection system comprises an input data processing section 11 for converting input data to desired format data, a critical condition storage 6 for storing critical conditions regarding the generation of defects, a total simulation section 12 for carrying out overall simulation to the format data to output the result as format data for deciding hazardous processes, a mask simulation section 13 for carrying out mask simulation on the format data to output the result as format data or hazardous pattern deciding, a hazardous process deciding section 15 for comparing the format data for hazardous process deciding with the critical conditions for determining hazardous processes, and a hazardous pattern deciding section 16 for comparing the format data for hazardous pattern deciding with the critical conditions for deciding if a pattern is a hazardous pattern.