发明名称 SUBSTRATE CONTAINER, SUBSTRATE TRANSPORT SYSTEM, STORAGE DEVICE AND GAS SUBSTITUTING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate storage container in which atmosphere in the whole storage container can efficiently be substituted in a short time by suppressing the mixed foreign matters, and to provide a substrate transport system and a gas substituting method. SOLUTION: When gas is made to flow into the substrate storage container from a gas flow-in port disposed in the substrate storage container 200 storing a substrate 40 and the atmosphere in the substrate storage container is replaced, the atmosphere in the substrate storage container is sucked and the inside is made negative in pressure against the outside air.</p>
申请公布号 JP2003092345(A) 申请公布日期 2003.03.28
申请号 JP20010233960 申请日期 2001.08.01
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 TOKUNAGA KENJI
分类号 B65D85/00;B65D85/86;B65G49/00;H01L21/00;H01L21/673;(IPC1-7):H01L21/68 主分类号 B65D85/00
代理机构 代理人
主权项
地址