ETCH APPARATUS HAVING SHIELD RING

摘要

PURPOSE: An etch apparatus having a shield ring is provided to prevent an etching phenomenon of the shield ring and an etching error in an etch process by improving a structure of the shield ring. CONSTITUTION: A shield ring(10) has the first end portion(11) and the second end portion(12). The first end portion(11) has a shape of ring. The first end portion(11) and the second end portion(12) are formed with one body. A stepped portion is formed between the first end portion(11) and the second end portion(12). The shield ring(10) is located at the outside of an upper electrode. The shield ring(10) is formed with a ceramic material in order to protect peripheral components from an etch process. The shield ring(10) can be formed with the ceramic material of a group including alumina oxide or titanium oxide.