发明名称 APPARATUS FOR PROTECTING WAFER LIFT ASSEMBLY OF ION IMPLANTER
摘要 PURPOSE: An apparatus for protecting a wafer lift assembly of an ion implanter is provided to operate smoothly a wafer lift by preventing or intercepting the inflow of contaminants into the wafer lift. CONSTITUTION: A wafer lift(10) is installed in the inside of a bracket device(50). A plurality of spindle driving portions(21,22) are installed at a lower end portion of the wafer lift(10) in order to drive a plurality of disks. A protective cover(15) is used for covering a lower end portion of a wafer lift(10) toward a direction of a shaft in order to prevent disturbance of a lubricating operation due to contaminant generated from the inside of a bracket device(50) to a lower end portion of a wafer lift(10). A scan shaft(40) is inserted into the bracket device(50). An exhaust line(60) is installed nearly to the spindle driving portions(21,22).
申请公布号 KR20030025006(A) 申请公布日期 2003.03.28
申请号 KR20010057885 申请日期 2001.09.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, YEON HA;KIM, MIN HO
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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