发明名称 |
APPARATUS FOR PROTECTING WAFER LIFT ASSEMBLY OF ION IMPLANTER |
摘要 |
PURPOSE: An apparatus for protecting a wafer lift assembly of an ion implanter is provided to operate smoothly a wafer lift by preventing or intercepting the inflow of contaminants into the wafer lift. CONSTITUTION: A wafer lift(10) is installed in the inside of a bracket device(50). A plurality of spindle driving portions(21,22) are installed at a lower end portion of the wafer lift(10) in order to drive a plurality of disks. A protective cover(15) is used for covering a lower end portion of a wafer lift(10) toward a direction of a shaft in order to prevent disturbance of a lubricating operation due to contaminant generated from the inside of a bracket device(50) to a lower end portion of a wafer lift(10). A scan shaft(40) is inserted into the bracket device(50). An exhaust line(60) is installed nearly to the spindle driving portions(21,22).
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申请公布号 |
KR20030025006(A) |
申请公布日期 |
2003.03.28 |
申请号 |
KR20010057885 |
申请日期 |
2001.09.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, YEON HA;KIM, MIN HO |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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