| 摘要 |
A pattern−forming material which comprises a base resin having a unit represented by the chemical formula[1]and an acid generator.[Chemical formula 1][1](In the formula,R<sb>1</sb> is hydrogen,chlorine,fluorine,alkyl,or fluoroalkyl;and R<sb>2</sb> is a protective group which is eliminated by the action of an acid.)
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| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO.,LTD.;KISHIMURA, SHINJI;ENDO, MASAYUKI;SASAGO, MASARU;UEDA, MITSURU;FUJIGAYA, TSUYOHIKO |
发明人 |
KISHIMURA, SHINJI;ENDO, MASAYUKI;SASAGO, MASARU;UEDA, MITSURU;FUJIGAYA, TSUYOHIKO |
