发明名称 Increased capacitance trench capacitor
摘要 Disclosed is a method of increasing the capacitance of a trench capacitor by increasing sidewall area, comprising: forming a trench in a silicon substrate, the trench having a sidewall; forming islands on the sidewall of the trench; and etching pits into the sidewall using the islands as a mask. The capacitor is completed by forming a node insulator on said on the pits and the sidewall; and filling said trench with a trench conductor.
申请公布号 US2003060005(A1) 申请公布日期 2003.03.27
申请号 US20010682607 申请日期 2001.09.26
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FURUKAWA TOSHIHARU;HAKEY MARK C.;HOLMES STEVEN J.;MA WILLIAM H.
分类号 H01L21/02;H01L21/8242;H01L29/94;(IPC1-7):H01L21/824;H01L21/20 主分类号 H01L21/02
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