| 摘要 |
<p>A composition for actinic energy rays which comprises (A) a specific compound having a vinyl ether group bonded to a secondary or tertiary carbon, (B) a polymer having carboxy or/and hydroxyphenyl groups, and (C) a photo-acid generator. The composition can form a resist pattern with excellent resolution without being heated at a temperature not lower than 60°C after exposure.</p> |
