发明名称 |
Exposure apparatus, method of controlling same, and method of manufacturing devices |
摘要 |
The time needed to set parameters in an exposure apparatus can be shortened by providing the apparatus with a parameter editing system having a function through which at least two parameters are defined by a common expression in a parameter setting area displayed on an editing screen for setting the parameters.
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申请公布号 |
US2003061596(A1) |
申请公布日期 |
2003.03.27 |
申请号 |
US20020247293 |
申请日期 |
2002.09.20 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MOTOKI TOSHIHIKO |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G06F17/50 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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