发明名称 Exposure apparatus, method of controlling same, and method of manufacturing devices
摘要 The time needed to set parameters in an exposure apparatus can be shortened by providing the apparatus with a parameter editing system having a function through which at least two parameters are defined by a common expression in a parameter setting area displayed on an editing screen for setting the parameters.
申请公布号 US2003061596(A1) 申请公布日期 2003.03.27
申请号 US20020247293 申请日期 2002.09.20
申请人 CANON KABUSHIKI KAISHA 发明人 MOTOKI TOSHIHIKO
分类号 G03F7/20;H01L21/027;(IPC1-7):G06F17/50 主分类号 G03F7/20
代理机构 代理人
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